用于MEMS和圆片级封装的新型干膜负性光刻胶

Engineered Material Systems, Inc., a leading global supplier of negative photo resist materials for MEMS and TSV passivation/sealing applications, is pleased to introduce the DF-2005 dry-film negative photo resist for use in micro-electromechanical systems (MEMS), wafer-level packaging and CMOS applications (metallization).This material formulation has been optimized for hot roll lamination and processing on MEMS and IC wafers.

DF-2005 is capable of extremely fine line and space definition in complex patterns. The cured chemistry can withstand harsh environments including resistance to extreme moisture conditions and corrosive chemicals.

The DF-2005 film is tougher (less brittle) than most negative photo resists on the market with a glass transition temperature of 145°C (By DMA Tan Delta) and a moderate modulus of 4.5 GPa at 25°C. It is hydrophobic in nature, providing chemical and moisture resistance. DF-2005 is compatible with and can be used in contact with the EMS line of spin-coatable photoresists.

DF-2005 is the latest addition to Engineered Materials Systems full line of film and liquid negative photo resists formulated for making microfluidic channels on MEMS devices andintegrated circuits.

For more information about the DF-2005 negative photo resist or to learn how Engineered Materials Systems can define, develop and create an engineered material solution that is right for your company, visit www.emsadhesives.com.

About Engineered Material Systems

Engineered Materials Systems, Inc. (EMS) technology focus is on electronic materials for semiconductor, circuit assembly, photovoltaic, printer head, camera module, disk drive and photonics assembly product lines. The company creates continual improvements that will guide its customers into the future. For more information, visitwww.emsadhesives.com.

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